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Afghanistan PVT Crystal Growth Furnace – Resistance Furnace
Applicable Field: Single Crystal Growth
Applicable materials: Si, AlN
Wafer sizes: 12/8 inches, with 8-inch multi-crucible options.
Category:
AfghanistanCompound Crystal Equipment
AfghanistanPVT Method Single-Crystal Growth Equipment
Product Description
Product Applications
Applicable Field: Single Crystal Growth
Applicable materials: Si, AlN
Wafer sizes: 12/8 inches, with 8-inch multi-crucible options.
Technical Specifications / Technical Parameters
Process Temperature Range: 2400°C
Heating Method: Induction/Resistance