Norway PVT Crystal Growth Furnace – Resistance Furnace

Applicable Field: Single Crystal Growth Applicable materials: Si, AlN Wafer sizes: 12/8 inches, with 8-inch multi-crucible options.

Category:

NorwayCompound Crystal Equipment

NorwayPVT Method Single-Crystal Growth Equipment

Product Description

Product Applications

Applicable Field: Single Crystal Growth

Applicable materials: Si, AlN

Wafer sizes: 12/8 inches, with 8-inch multi-crucible options.

Technical Specifications / Technical Parameters

Process Temperature Range: 2400°C

Heating Method: Induction/Resistance

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