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Papua New Guinea Oxidation/Diffusion/Annealing Furnace
♦ Applicable Fields: Integrated Circuits, Advanced Packaging
♦ Suitable Materials: Si, SiC
♦ Wafer Size: 12/8 inches
♦ Applicable Processes: Oxidation, Annealing, Polyimide Curing, Alloy, Diffusion
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Papua New GuineaOxidation/Diffusion/Annealing Furnace
Product Description
Product Applications
♦ Applicable Fields: Integrated Circuits, Advanced Packaging
♦ Suitable Materials: Si, SiC
♦ Wafer Size: 12/8 inches
♦ Applicable Processes: Oxidation, Annealing, Polyimide Curing, Alloy, Diffusion
Technical Parameters
♦ Process Temperature Range: 300°C-1200°C
♦ Batch Capacity: 100-150 wafers