Papua New Guinea Oxidation/Diffusion/Annealing Furnace

Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors Suitable Materials: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN) Wafer Size: 12/8 inches Applicable Processes: Oxidation, Annealing, Polyimide Curing, Alloy Formation, Diffusion, High-Temperature Annealing

Category:

Papua New GuineaHorizontal Furnace Tube Equipment

Papua New GuineaSemiconductor chip equipment

Papua New GuineaOxidation/Diffusion/Annealing Furnace

Phone:+86-15562450816

contact

Product Description

Product Applications:

♦ Application Areas: Integrated Circuits, Advanced Packaging, Compound Semiconductors Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors

♦ Applicable Materials: Si, SiC, GaN – Suitable for Processing: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN)

♦ Wafer Size: 12/8 inches

♦ Applicable Processes: Oxidation, Annealing, Polyimide Curing, Alloying, Diffusion Applicable Processes: High-Temperature Annealing

Technical Parameters:

♦ Process Temperature Range: 300°C–1250°C

♦ Batch Size: 100–250 pieces Batch Capacity: 100–250 pcs

Papua New Guineanone

Papua New GuineaLPCVD Equipment

: next page

Online Message

Product display

Vertical Furnace Tube Equipment

Horizontal Furnace Tube Equipment

PVT Sing Crystal Growth Equipment

HVPE Sing Crystal Growth Equipment

Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park

Telephone:+86-15562450816

Mailbox:liguan1218@163.com