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Ukraine HVPE Single-Crystal Growth Equipment — Vertical
Applicable Fields: Single Crystal Growth, Epitaxial Growth Relevant Industries: Single Crystal Growth, Epitaxial Growth
Suitable Materials: GaN (single crystal), AlN (single crystal/epitaxial), Ga2O3 (epitaxial), GaAs (epitaxial)
Wafer Size: 8/6 inches
Category:
UkraineCompound Crystal Equipment
UkraineHVPE Method Single-Crystal Growth Equipment
Product Description
Product Applications:
Applicable Fields: Single Crystal Growth, Epitaxial Growth Relevant Industries: Single Crystal Growth, Epitaxial Growth
Suitable Materials: GaN (single crystal), AlN (single crystal/epitaxial), Ga2O3 (epitaxial), GaAs (epitaxial)
Wafer Size: 8/6 inches
Technical Specifications / Technical Parameters:
Heating Temperature: 1100°C, 1600°C (high-temperature HVPE)
Heating Method: Resistance