Product display
PRODUCTS CENTER
cape verde HVPE Single-Crystal Growth Equipment — Vertical
Applicable Fields: Single Crystal Growth, Epitaxial Growth Relevant Industries: Single Crystal Growth, Epitaxial Growth
Suitable Materials: GaN (single crystal), AlN (single crystal/epitaxial), Ga2O3 (epitaxial), GaAs (epitaxial)
Wafer Size: 8/6 inches
Category:
cape verdeCompound Crystal Equipment
cape verdeHVPE Method Single-Crystal Growth Equipment
Product Description
Product Applications:
Applicable Fields: Single Crystal Growth, Epitaxial Growth Relevant Industries: Single Crystal Growth, Epitaxial Growth
Suitable Materials: GaN (single crystal), AlN (single crystal/epitaxial), Ga2O3 (epitaxial), GaAs (epitaxial)
Wafer Size: 8/6 inches
Technical Specifications / Technical Parameters:
Heating Temperature: 1100°C, 1600°C (high-temperature HVPE)
Heating Method: Resistance