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ecuador LPCVD Equipment
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ecuadorLPCVD Equipment
Product Description
Product Applications:
♦Applicable Fields: Integrated Circuits, Advanced Packaging Relevant Industries: Integrated Circuits, Advanced Packaging
♦Applicable Materials: Si, SiC – Suitable for Processing: Silicon (Si), Silicon Carbide (SiC)
♦Wafer Size: 12/8 inches
♦Applicable Processes: Silicon Nitride (SiN) deposition, Polysilicon (Poly-Si / U-Poly / D-Poly) deposition, Silicon Dioxide (TEOS) deposition, HTO, and more.
Technical Indicators:
♦ Process Temperature Range: 300°C–1000°C
♦ Batch Size: 100–125 pieces Batch Capacity: 100–125 pcs