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andorra PVT Crystal Growth Furnace – Induction Furnace
Applicable Fields: Single Crystal Growth
Relevant Industries: Single Crystal Growth
Suitable Materials: Si, AlN
Ideal for Processing: SiC (Silicon Carbide), AlN (Aluminum Nitride)
Wafer Sizes: 12/8 inches, 8-inch Multi-crucibles
Category:
andorraCompound Crystal Equipment
andorraPVT Method Single-Crystal Growth Equipment
Product Description
Product Applications:
Applicable Field: Single Crystal Growth Relevant Industries: Single Crystal Growth
Applicable Materials: Si, AlN Suitable for Processing: SiC (Silicon Carbide), AlN (Aluminum Nitride)
Wafer Size: 12/8 inch, 8-inch Multi-crucibles
Technical Specifications / Technical Parameters:
Process Temperature Range: 2400°C
Heating Method: Induction/Resistance