Shandong Liguan Microelectronics Equipment

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LPE Single Crystal Growth Equipment

This equipment is mainly used for the single crystal growth of siliconcarbide(SiC) .LPE method enables the growth of SiC single crystals below much lower temperatures (<2000°C), which theoretically makes it easier  to obtain high-quality single crystals. The temperature gradient is utilized as a growth driver to achieve crystal growth.

Induction furnace

This equipment is mainly used for the single crystal growth of siliconcarbide(SiC) and aluminumnitride(AIN).

Resistance furnace

This equipment is mainly used for the single crystal growth of siliconcarbide(SiC) and aluminumnitride(AIN).

SiC seed crystal bonding equipment

The equipment is to bond SiC seed crystals to graphite by means of an organic adhesive.Improving the  bonding quality of seed crystals is the primary prerequisite to ensure the growth of high quality Sic  crystals.

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