Product display
Product classification
Contact Information
Address: Jinan Wide Band-gap Semiconductor Industrial Park, Huaiyin District, Jinan City
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
This equipment is one of the important process equipments in the front process of semiconductor production line,which is used for diffusion, oxidation, annealing, alloying and sintering in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices.
This equipment is one of the important process equipments in the front process of semiconductor production line,which is used for diffusion, oxidation, annealing, alloying and sintering in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices.
SiC High Temperature Oxidation Furnace
Specially used for oxidation treatment of silicon-carbon compounds (SiC), which can realize the high-temperature oxidaton process of SiC sheets in high-temperature environment.The oxidation process uses O2, O2/H2, N2O, NO, which is thesafest oxidizing furnace for toxic gas.
SiC High Temperature Annealing Furnace
It is specially used for ion activation and annealing treatment of silicon carbon compound (SiC), which can realize the active process of Sic wafer in high temperature and vacuum environment.
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing.which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing,which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.