Product classification

Contact Information

Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park

SiC High Temperature Annealing Furnace

Classification:

Diffusion/oxidation/annealing

Summary:

It is specially used for ion activation and annealing treatment of silicon carbon compound (SiC), which can realize the active process of Sic wafer in high temperature and vacuum environment.

Key words:

SiC High Temperature Annealing Furnace

Product Introduction：

♦ It is specially used for ion activation and annealing treatment of silicon carbon compound (SiC), which can realize the active process of Sic wafer in high temperature and vacuum environment.

♦The equipment is suitable for ion activation and annealing process in the manufacture of SiC-based power devices

♦ ed to provide the cleanliness of the process chamber

Product Characteristics：

♦ The vertical structure is adopted, the process is well controlled, the temperature distribution is uniform, and the airflow is stable

♦ Robot Auto Transfer

♦ Multi-point temperature control, uniform temperature

♦ Has various alarm functions and safety protection functions

Technical Indicators：

♦ Wafer size: 6-8 inches

♦ Process temperature range: 800-2000°C

♦ Batch capacity: 50-100 pcs

SiC High Temperature Oxidation Furnace