Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
SiC High Temperature Oxidation Furnace
Classification:
Diffusion/oxidation/annealing
Summary:
Key words:
SiC High Temperature Oxidation Furnace
Product Introduction：
Specially used for oxidation treatment of silicon-carbon compounds (SiC), which can realize the high-temperature oxidaton process of SiC sheets in high-temperature environment.The oxidation process uses O2, O2/H2, N2O, NO, which is thesafest oxidizing furnace for toxic gas.
Technical Indicators：
♦ Wafer size: 6-8 inches
♦ Process temperature range: 800-1600°C
♦ Batch capacity: 50-100 pcs
产品特点/ Product characteristics：
♦ The vertical structure is adopted, the process is well controlled, the temperature distribution is uniform, and the airflow is stable
♦ Robot Auto Transfer (Optional)
♦ Multi-point temperature control, uniform temperature
♦ Has various alarm functions and safety protection functions
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SiC High Temperature Annealing Furnace