Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
LPCVD Horizontal Furnace
Classification:
CVD equipment
Summary:
Key words:
LPCVD Horizontal Furnace
Product Introduction：
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing.which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.
Product Characteristics：
♦Silicon carbide (SiC) cantilever paddle is used for loading, which avoids dust generated by friction with process pipe
♦The temperature control adopts cascade control mode, and the real-time intelligent control of the actual temperature of the substrate is carried out
♦Closed-loop automatic control of chamber pressure improves process stability and repeatability
♦Multi-process combination of machines according to customer demand
Technical Indicators：
♦ Wafer size: 6-8 inch wafer
♦Process temperature range: 500°C-900°C
♦Length of constant temperature zone: ≥ 800 mm
♦Temperature control accuracy: ±1°C
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LPCVD Vertical Furnace