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LPE Single Crystal Growth Equipment


Classification:

SiC single crystal growth equipment


Summary:

This equipment is mainly used for the single crystal growth of siliconcarbide(SiC) .LPE method enables the growth of SiC single crystals below much lower temperatures (<2000°C), which theoretically makes it easier  to obtain high-quality single crystals. The temperature gradient is utilized as a growth driver to achieve crystal growth.

Key words:



LPE Single Crystal Growth Equipment


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