Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
LPCVD Horizontal Furnace
Classification:
CVD equipment
Semiconductor process equipment
Horizontal LPCVD
Summary:
Key words:
LPCVD Horizontal Furnace
Product Introduction:
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing,which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.
Product Characteristics:
♦ Silicon carbide (SiC) cantilever paddle is used for loading, which avoids dust generated by friction with process tube.
♦ The temperature control adopts cascade control mode, and the real-time intelligent control of the actual temperature of the substrate is carried out.
♦ Closed-loop automatic control of chamber pressure improves process stability and repeatability.
♦ Multi-process combination of machines according to customer demand.
Technical Indicators:
♦ Wafer size: 6-8 inch wafer
♦ Process temperature range: 500°C-1000°C
♦ Length of constant temperature zone: ≥ 800 mm
♦ Temperature control accuracy: ±1°C
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