Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
Horizontal furnace
Classification:
Oxidation/Diffusion/Annealing
Products
Semiconductor process equipment
Horizontal furnace
Summary:
Key words:
Horizontal furnace
Product Introduction:
This equipment is one of the important process equipment in the pre production process of semiconductor production lines, used for oxidation, diffusion, annealing, alloy and other processes in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices, etc.
Oxidation process: mainly used for the preparation of various oxide dielectric layers such as initial oxide layer, gate oxide layer, field oxide layer, etc.
Product Characteristics:
♦ High cleanliness: including materials, process environment, etc.
♦ High precision: including furnace temperature, inlet flow, exhaust pressure, motion control, etc.
♦ High safety: including gas leakage detection, airflow detection, man-machine interlocking, etc.
Technical Indicators:
♦ Wafer size: 6/8/12 inch
♦ Process temperature range: 300°C-1250°C
♦ Batch capacity: 100-150 pcs
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