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SiC High-Temperature Oxidation Furnace


Classification:

Vertical Furnace Tube Equipment

Semiconductor chip equipment

SiC High-Temperature Oxidation Furnace


Summary:

♦ Application Fields: Compound Semiconductors Relevant Industries: Compound Semiconductors ♦ Suitable Material: SiC Ideal for Processing: Silicon Carbide (SiC) ♦ Wafer Size: 8/6 inches ♦ Applicable Process: High-Temperature Oxidation

Key words:



SiC High-Temperature Oxidation Furnace


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