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Address: Jinan Wide Band-gap Semiconductor Industrial Park, Huaiyin District, Jinan City
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
◆ Rapid annealing furnace is the use of infrared thermal radiation to achieve rapid heating of a semiconductor heat treatment process equipment. The semiconductor silicon wafer located in the process chamber is rapidly heated by the lamp radiation type heat source power control module device and the special lamp group to achieve a stable heating process