Product classification

Contact Information

Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park

RTP Rapid Annealing Equipment

Classification:

Rapid annealing furnace

Summary:

◆ Rapid annealing furnace is the use of infrared thermal radiation to achieve rapid heating of a semiconductor heat treatment process equipment. The semiconductor silicon wafer located in the process chamber is rapidly heated by the lamp radiation type heat source power control module device and the special lamp group to achieve a stable heating process

Key words:

RTP Rapid Annealing

RTP Rapid Annealing Equipment

Product Introduction：

Rapid annealing furnace is a kind of semiconductor heat treatment equipment which uses infrared heat radiation to realize rapid heating. The semiconductor silicon wafer located in the process cavity is rapid-ly heated by a light radiation type heat source power control module device and a special lamp group to realize a stable heating process

Product Characteristics：

◆ High temperature control precision and good repeatability

◆ Clean and clean process chamber

◆ Users can customize the process gas according to their requirements, and can configure up to 6channels of gas

◆ Computer automatic control of technological process

◆ Sample size: 2-6 inches

◆ Temperature rise and fall rate: 0-100 °c/s controllable

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