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Oxidation/Diffusion
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♦The equipment is one of the important process equipment before the semiconductor production line, used for large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices and other industries, such as diffusion, oxidation, annealing, alloy and sintering process ♦A variety of process performance requirements for silicon wafer production are designed, which has the characteristics of high growth efficiency and superior product performance ♦It has the advantages of low pollution, small footprint, uniform temperature, large wafer size and high process stability ♦It is mainly used for the preparation process of various oxide dielectric layers such as initial oxide layer, shielding oxide layer, pad oxide layer, sacrificial oxide layer, field oxide layer, etc
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