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LPCVD (Vertical/Horizontal)
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♦LPCVD equipment is one of the important equipment for the manufacture of semiconductor integrated circuits, mainly used for the growth of polysilicon, silicon nitride, silicon oxide film, it is the raw material gas (or liquid source gasification) with thermal energy to activate the chemical reaction to generate a solid film on the surface of the substrate. LPCVD process is carried out under low pressure, due to the low pressure, the average free path of gas molecules is large, so that the growth of the film uniformity is good, in addition to the substrate can be placed vertically so that the equipment is large, especially suitable for industrial production.
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