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PVT Crystal Growth Furnace – Resistance Furnace


Classification:

Compound Crystal Equipment

PVT Method Single-Crystal Growth Equipment


Summary:

Applicable Fields: Single Crystal Growth Relevant Industries: Single Crystal Growth Applicable Materials: Si, AlN Suitable for Processing: SiC (Silicon Carbide), AlN (Aluminum Nitride) Wafer Sizes: 12/8/6/4 inches, with 8-inch multi-crucible systems available; 6/8-inch processes also supported

Key words:



PVT Crystal Growth Furnace – Resistance Furnace


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