Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
PVT Crystal Growth Furnace – Resistance Furnace
Classification:
Compound Crystal Equipment
PVT Method Single-Crystal Growth Equipment
Summary:
Key words:
PVT Crystal Growth Furnace – Resistance Furnace
Product Applications
Applicable Field: Single Crystal Growth Relevant Industries: Single Crystal Growth
Applicable materials: Si, AlN Suitable for processing: SiC (Silicon Carbide), AlN (Aluminum Nitride)
Wafer sizes: 12/8/6/4 inches, with 8-inch multi-crucible options. Wafer Size: 12/8/6/4 inch, 8-inch Multi-crucibles Provide 6/8-inch process
Technical Specifications / Technical Parameters
Process Temperature Range: 2400°C
Heating Method: Induction/Resistance
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PVT Crystal Growth Furnace – Induction Furnace
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