Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
LPCVD Horizontal Furnace
Classification:
CVD equipment
Semiconductor process equipment
Horizontal LPCVD
Summary:
Key words:
LPCVD Horizontal Furnace
Product Introduction:
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing, mainly used for POLY, D-POLY, SiN, LP-TEOS.
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing. which is mainly used for the growth of LP-POLY, LP-DPOLY, LP-SiN, LP-TEOS thin films.
Product Characteristics:
♦ Silicon carbide (SiC) cantilever paddle is used for loading, which avoids dust generated by friction with process pipe.
Silicon carbide (SiC) cantilever paddle is used for loading, which avoids dust generated by friction with process pipe.
♦ The temperature control adopts cascade control mode, and the real-time intelligent control of the actual temperature of the substrate is carried out.
The temperature control adopts cascade control mode, and the real-time intelligent control of the actual temperature of the substrate is carried out.
♦ Closed-loop automatic control of chamber pressure improves process stability and repeatability.
Closed-loop automatic control of chamber pressure improves process stability and repeatability.
♦ Multi-process combination of machines according to customer demand.
Multi-process combination of machines according to customer demand.
Technical Indicators:
♦ Wafer size: 6-8 inch wafer
♦ Process temperature range: 500°C-1000°C
♦ Length of constant temperature zone: ≥ 800 mm
♦ Temperature control accuracy: ±1°C
Previous
Next
Previous
None
Next
More products