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Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
Oxidation/Diffusion/Annealing Furnace
Classification:
Horizontal Furnace Tube Equipment
Semiconductor chip equipment
Oxidation/Diffusion/Annealing Furnace
Summary:
Key words:
Oxidation/Diffusion/Annealing Furnace
Product Applications:
♦ Application Areas: Integrated Circuits, Advanced Packaging, Compound Semiconductors Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors
♦ Applicable Materials: Si, SiC, GaN – Suitable for Processing: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN)
♦ Wafer Size: 12/8/6 inches
♦ Applicable Processes: Oxidation, Annealing, Polyimide Curing, Alloying, Diffusion Applicable Processes: High-Temperature Annealing
Technical Parameters:
♦ Process Temperature Range: 300°C–1250°C
♦ Batch Size: 100–250 pieces Batch Capacity: 100–250 pcs
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