Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
LPCVD vertical furnace
Classification:
CVD equipment
Semiconductor process equipment
Vertical LPCVD
Summary:
Key words:
LPCVD vertical furnace
Product Introduction:
♦ One of the important equipment for semiconductor integrated circuit manufacturing, mainly used for POLY, D-POLY, SiN, LP-TEOS.
LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing, which is mainly used for the growth of LP-POLY, LP-DPOLY, LP-SiN, LP-TEOS thin films.
♦ The vertical LPCVD adopts a bell jar structure, designed with a nested cavity manipulator film transmission assembly and boat rotation assembly, which has the advantages of small occupied area, high film formation uniformity, and high process stability.
Vertical LPCVD adopts bell jar structure, and designs nested cavity manipulator film transmission assembly and boat rotation assembly, which has the advantages of small occupied area, high film formation uniformity and high process stability.
Product Characteristics:
♦ Fully automatic transmission, accurate positioning, stability and reliability.
Fully automatic transmission, accurate positioning, stability and reliability.
♦ High cleanliness process environment, effective pollution control.
High cleanliness process environment, effective pollution control.
Technical Indicators:
♦ Wafer Size: 6/8/12 inches
♦ Process temperature range: 300°C-1000°C
♦ Batch capacity: 100-150 pcs
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LPCVD Horizontal Furnace
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