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Crucible Drop Furnace


Classification:

GaAs / InP single crystal growth equipment


Summary:

This device is mainly used for the growth of compound crystals such as Gallium Arsenide (GaAs) and Indium Phosphide (InP). The device consists of a rack, an ampoule support mechanism, a heater, and a control system, capable of precise control of ampoule movement and rotation.

Key words:



Crucible Drop Furnace


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