Product classification

Contact Information

Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park

MPCVD Equipment

Classification:

Third generation semiconductor process equipment

Summary:

♦Microwave plasma chemical vapor deposition (MPCVD) technology, through the plasma to increase the reaction rate of the precursor, reduce the reaction temperature. It is suitable for preparing diamond single crystal and polycrystalline films with large area, good uniformity, high purity and good crystal morphology.

Key words:

MPCVD

MPCVD Equipment

Product Introduction:

♦ Microwave plasma chemical vapor deposition (MPCVD), which increases the reaction rate of precur-sors and reduces the reaction temperature by plasma. It is suitable for preparing diamond single crystal and polycrystalline films with large area, good uniformity, high purity and good crystal morphology.

Technical Indicators:

Temperature measurement: 300-1500°C	Limit vacuum: 5*10E-4Pa
Gas path system: 6 channels	Pressure range: 5-300Torr
Microwave power: 0.5-15Kw continuously adjustable	Power stability: < 2%
Ripple:≤1%	Microwave frequency: 2450MHz土50MHz
Microwave leakage value: < 5Mw/cm²	Discharge area: ≥100mm
Sedimentation area:≥80 mm	Growth rate: > 12um