Product classification
Contact Information
Address: Jinan, Huaiyin District, Jinan City, Jinan Wide Forbidden Belt Semiconductor Industrial Park
Telephone:+86-15562450816
Mailbox:liguan1218@163.com
MPCVD Equipment
Classification:
Third generation semiconductor process equipment
Summary:
Key words:
MPCVD
MPCVD Equipment
Product Introduction:
♦ Microwave plasma chemical vapor deposition (MPCVD), which increases the reaction rate of precur-sors and reduces the reaction temperature by plasma. It is suitable for preparing diamond single crystal and polycrystalline films with large area, good uniformity, high purity and good crystal morphology.
Technical Indicators:
|
Temperature measurement: 300-1500°C |
Limit vacuum: 5*10E-4Pa |
|
Gas path system: 6 channels |
Pressure range: 5-300Torr |
|
Microwave power: 0.5-15Kw continuously adjustable |
Power stability: < 2% |
|
Ripple:≤1% |
Microwave frequency: 2450MHz土50MHz |
|
Microwave leakage value: < 5Mw/cm² |
Discharge area: ≥100mm |
|
Sedimentation area:≥80 mm |
Growth rate: > 12um |
Previous
SiC high temperature oxidation equipment