HVPE Epitaxial Furnace - Horizontal

This　equipment　is　mainly　Used　for　the　growth　of galiumnitride(GaN)single　crystal；Used for the epitaxial  growth of gallium oxide （Ga2O3），aluminum nitride（AIN）， indium phosphide（InP）and gallium arsenide（GaAs）.

Vertical Bridgman Process (VB) Furnace

This equipment is mainly used for single crystal growth of Gallium Oxide (Ga2O3) (non-iridium method), where the raw material is placed in a vertical crucible and then directionally solidified from the tip of the crucible through a pre-set temperature gradient zone. Single crystals are grown by slow cooling.

MPCVD equipment

The equipment is mainly used forthe preparation of single crystal diamond.It can excite the plasma cluster with high stability, thus ensuring the continuity of single crystal growth and providing a strong guarantee for the synthesis of large-size single crystal diamond.

Vertical Furnace

This equipment is one of the important process equipments in the front process of semiconductor production line,which is used for diffusion, oxidation, annealing, alloying and sintering in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices.

horizontal type Furnace

This equipment is one of the important process equipments in the front process of semiconductor production line,which is used for diffusion, oxidation, annealing, alloying and sintering in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices.

SiC High Temperature Oxidation Furnace

Specially used for oxidation treatment of silicon-carbon compounds (SiC), which can realize the high-temperature oxidaton process of SiC sheets in high-temperature environment.The oxidation process uses O2, O2/H2, N2O, NO, which is thesafest oxidizing furnace for toxic gas.

SiC High Temperature Annealing Furnace

It is specially used for ion activation and annealing treatment of silicon carbon compound (SiC), which can realize the active process of Sic wafer in high temperature and vacuum environment.

LPCVD Horizontal Furnace

LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing.which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.

LPCVD Vertical Furnace

LPCVD equipment is one of the important equipments for semiconductor integrated circuit manufacturing,which is mainly used for the growth of LP-POLY,LP-DPOLY,LP-SiN，LP-TEOS thin films.